D07700 - SEMI D77 - Test Method for Measurements of Dimension of Films for FPD – Contour Matching Method Revision:SEMI D77-0618 - Superseded which will

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basic equipment states for all of the conditions and associated periods of time for an equipment system during an observation period

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terms used to describe the characteristics of the edge profile of silicon wafers are named and their meaning is illustrated by a schematic drawing

D07700 - SEMI D77 - Test Method for Measurements of Dimension of Films for FPD – Contour Matching Method Revision:SEMI D77-0618 - Superseded which willThis Standard establishes the method that evaluates with high precision a shape of the polarizing films and other films for FPD, especially non rectangle shape films. This Standard specifies the measurement method of polarizing films and other films for FPD by using contour matching method. This Standard can apply to rectangle shapes. Especially non rectangle shapes are effective. Examples of the other films except polarizing films are retardation