P04200 - SEMI P42 - Specification of Reticle Data for Automatic Recipe Transfer to Wafer Exposure System StdPbc-0812 This method focuses on improving

This method focuses on improving the accuracy and repeatability of the measurement by standardizing the test conditions and reporting and by routine calibration of the measurement

参考までに，米国で通常使われている単位が2インチおよび3インチウェーハには用いられ，SI（メートル）単位が100 mm以上のウェーハには使われている。

In addition

本ガイドは，global Silicon Wafer Committeeで技術的に承認されている。現版は，2010年8月27日 ，global Audits & Reviews Subcommitteeにて発行が承認された。2010年10月にwww

P04200 - SEMI P42 - Specification of Reticle Data for Automatic Recipe Transfer to Wafer Exposure System StdPbc-0812 This method focuses on improvingThis specification was technically approved by the Global Micropatterning Committee and is the direct responsibility of the Japanese Micropatterning Committee. Current edition approved by the Japanese Regional Standards Committee on January 9, 2004. Initially available at www. semi. org February 2004; to be published March 2004. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not