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G06200 - SEMI G62 - 銀めっきの試験方法 StdTpc-Equipment - Facilities Interface The scope of this Document
G06200 - SEMI G62 - 銀めっきの試験方法 StdTpc-Equipment - Facilities Interface The scope of this Document
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Description
The scope of this Document lists the proposed impurity limits of 25% tetramethylammonium hydroxide used in the semiconductor industry
This Test Method covers the measurement of generation lifetime and generation velocity of silicon wafers
Refer to SEMI C90 for additional requirements for the use of polymers in LCDS
through the oxide layers
G06200 - SEMI G62 - 銀めっきの試験方法 StdTpc-Equipment - Facilities Interface The scope of this Documentglobal Assembly & Packaging Technical Committee201171global Audits and Reviews Subcommittee20118www. semiviews. org www. semi. org199520023 : Referenced SEMI Standards SEMI G55 Test Method for Measurement of Silver Plating Brightness SEMI G56 Test Method for Measurement of Silver Plating Thickness
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